by Florian Eacock, Mirko Schaper, Simon Althoff, Andreas Unger, Paul Eichwald, Florian Hengsbach, Carolin Zinn, Martin Joachim Holzweissig, Karsten Guth
Abstract:
Nowadays wire bonding is a widely-used technology for interconnecting chips in the packaging industry. Thereby, it is known that the bond quality massively depends upon the microstructure prevailing in the bond and consequently the materials used as well as the bonding parameters. However the actually used materials such as aluminum and gold are either characterized by comparibly poor conductivity or high costs, respectively. Due to its outstanding properties copper is a more attractive candidate. Still, a thorough investigation on the interrelationship between the material combinations, the processing parameters and the resulting microstructure for copper and aluminum wire bonding was not carried out yet. Depending on the aforementioned factors the microstructural evolution can be completely different during the bonding process. Therefore, this study focuses on the microstructural evolution of heavy copper and heavy aluminum wires bonded on copper substrates. The evolution of the wire microstructure as well as the wire-substrate-interface was investigated by scanning electron microscope in combination with electron backscatter diffraction and microhardness measurements. Various samples were extracted at different points of the bonding process, namely the as-received condition, after touchdown and after completed bonding. The results of the aluminum and copper wires were compared to each other in both longitudinal and transversal direction. It was found, that the two wire materials were completely different in the as-received condition regarding the grain size, the grain morphology, the texture and the microhardness. After touchdown the microstructure did not show significant changes in both materials, yet a strain-hardening was observed in the copper wire resulting from the touchdown force. When the bonding process was completed a different microstructure could be observed in both the wire as well as the layer for the materials investigated. Furthermore, a destinctive increase in the wire hardness could be found in case of copper, which was not observed for the aluminum wire. The ramifications between the two wire materials presented in this work will be discussed with the objective of optimizing the quality of the bonds.
Reference:
Eacock, F.; Schaper, M.; Althoff, S.; Unger, A.; Eichwald, P.; Hengsbach, F.; Zinn, C.; Holzweissig, M. J.; Guth, K.: Microstructural investigations of aluminum and copper wire bonds. Proceedings of the 47th International Symposium on Microelectronics, 2014.
Bibtex Entry:
@INPROCEEDINGS{Eacock2014,
author = {Florian Eacock AND Mirko Schaper AND Simon Althoff AND Andreas Unger
AND Paul Eichwald AND Florian Hengsbach AND Carolin Zinn AND Martin
Joachim Holzweissig AND Karsten Guth},
title = {Microstructural investigations of aluminum and copper wire bonds},
booktitle = {Proceedings of the 47th International Symposium on Microelectronics},
year = {2014},
abstract = {Nowadays wire bonding is a widely-used technology for interconnecting
chips in the packaging industry. Thereby, it is known that the bond
quality massively depends upon the microstructure prevailing in the
bond and consequently the materials used as well as the bonding parameters.
However the actually used materials such as aluminum and gold are
either characterized by comparibly poor conductivity or high costs,
respectively. Due to its outstanding properties copper is a more
attractive candidate. Still, a thorough investigation on the interrelationship
between the material combinations, the processing parameters and
the resulting microstructure for copper and aluminum wire bonding
was not carried out yet. Depending on the aforementioned factors
the microstructural evolution can be completely different during
the bonding process. Therefore, this study focuses on the microstructural
evolution of heavy copper and heavy aluminum wires bonded on copper
substrates. The evolution of the wire microstructure as well as the
wire-substrate-interface was investigated by scanning electron microscope
in combination with electron backscatter diffraction and microhardness
measurements. Various samples were extracted at different points
of the bonding process, namely the as-received condition, after touchdown
and after completed bonding. The results of the aluminum and copper
wires were compared to each other in both longitudinal and transversal
direction. It was found, that the two wire materials were completely
different in the as-received condition regarding the grain size,
the grain morphology, the texture and the microhardness. After touchdown
the microstructure did not show significant changes in both materials,
yet a strain-hardening was observed in the copper wire resulting
from the touchdown force. When the bonding process was completed
a different microstructure could be observed in both the wire as
well as the layer for the materials investigated. Furthermore, a
destinctive increase in the wire hardness could be found in case
of copper, which was not observed for the aluminum wire. The ramifications
between the two wire materials presented in this work will be discussed
with the objective of optimizing the quality of the bonds.},
doi = {10.4071/isom-THP32},
file = {Eacock2014.pdf:Eacock2014.pdf:PDF},
keywords = {Bonding, Copper, Microstructure evolution},
owner = {tobiasm},
timestamp = {2014.11.10}
}